The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 10, 2018

Filed:

Jan. 13, 2017
Applicant:

Janome Sewing Machine Co., Ltd., Tokyo, JP;

Inventor:

Takeshi Kongo, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
D05C 5/02 (2006.01); G06T 7/70 (2017.01); G06T 7/11 (2017.01); D05B 19/12 (2006.01); D05C 5/06 (2006.01); D05C 13/02 (2006.01); G06K 9/20 (2006.01); G06K 9/32 (2006.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 7/70 (2017.01); D05B 19/12 (2013.01); D05C 5/06 (2013.01); D05C 13/02 (2013.01); G06K 9/2063 (2013.01); G06K 9/3208 (2013.01); G06T 7/0004 (2013.01); G06T 7/11 (2017.01); G06T 2207/10004 (2013.01); G06T 2207/30124 (2013.01);
Abstract

Information with respect to an embroidery frame and information with respect to a mark alignment region are acquired. The mark alignment region is displayed for guiding multiple marks that are provided to an embroidery frame in order to define an embroidery region in the embroidery frame. When the multiple marks thus displayed are all positioned within the mark alignment region, an image of the embroidery region is acquired. Image analysis is performed based on the information with respect to the embroidery frame thus acquired and the information with respect to the multiple corresponding marks within the acquired image. Subsequently, the embroidery region within the embroidery frame is determined based on the analysis result. This allows the embroidery region to be detected with high precision in a simple manner.


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