The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
Sep. 15, 2016
Fujitsu Frontech Limited, Tokyo, JP;
Tomoharu Suzuki, Inagi, JP;
FUJITSU FRONTECH LIMITED, Tokyo, JP;
Abstract
A biometrics authentication device is configured to include a non-directional feature generation process unit configured to generate a non-directional feature on the basis of a directional features; a directional feature generation process unit configured to select, from among the directional features, a reference directional feature corresponding to a reference direction; a non-directional feature matching process unit configured to obtain a first degree of similarity between the non-directional feature and a registered non-directional feature; a directional feature matching process unit configured to obtain a second degree of similarity between the reference directional feature and a registered reference directional feature; and a determination unit configured to make a weight of the second degree of similarity smaller than a weight of the first degree of similarity and to determine whether or not a subject is a person to be authenticated, by using the first degree of similarity and the second degree of similarity.