The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
Feb. 06, 2017
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventor:
Shinji Uchida, Utsunomiya, JP;
Assignee:
CANON KABUSHIKI KAISHA, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/707 (2013.01); G03F 7/0002 (2013.01);
Abstract
The present invention provides a lithography apparatus that performs patterning on a substrate using an original, the apparatus including a supply device configured to supply a gas to a space between the substrate and the original, a chuck configured to hold the substrate, a movable device that holds the chuck and is movable, and a plate provided on the movable device and surrounding the chuck, wherein the chuck includes a first edge, on a side of the chuck facing the original, protruding toward the plate.