The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
Oct. 29, 2015
Sandia Corporation, Albuquerque, NM (US);
Cameron Musgrove, Albuquerque, NM (US);
Richard M. Naething, Albuquerque, NM (US);
Richard C. Ormesher, Albuquerque, NM (US);
National Technology & Engineering Solutions of Sandia, LLC, Albuquerque, NM (US);
Abstract
The various technologies presented herein relate to reducing and/or filtering undesired artifacts in a SAR image, wherein the artifacts are generated by RF interference resulting from a communication signal being included in a radar return which also comprises radar clutter. The radar return is separated into two subapertures, a first subaperture comprising radar clutter only, and a second subaperture comprising radar clutter and the communication signal. The communication signal is extracted from the second subaperture and reapplied to the initially received radar return. Reapplication of the communication signal to the radar return enables any undesired artifacts arising from the communication signal to have their return strength reduced or minimized, while maintaining any desired radar returns in the SAR image.