The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 10, 2018

Filed:

Mar. 23, 2016
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Wei Guo, Shenzhen, CN;

LiCen Mu, Shenzhen, CN;

Qiuyi Yu, Shenzhen, CN;

WeiFeng Zhang, Shenzhen, CN;

Lin Zhao, Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G08B 21/00 (2006.01); G01R 31/00 (2006.01); H01L 27/02 (2006.01);
U.S. Cl.
CPC ...
G01R 31/001 (2013.01); H01L 27/0248 (2013.01);
Abstract

A first electrostatic discharge measurement is received from a first sensor. The first sensor utilizes a wireless network to send the first measurement from a first stage of the assembly line of electronic components susceptible to electrostatic discharge damage. A second electrostatic discharge measurement is received from a second sensor. The second sensor utilizes the wireless network to send the second measurement from a second stage of the assembly line. An electrostatic discharge history is updated for the first assembly stage based on the first electrostatic discharge measurement. The electrostatic discharge history is updated for the second assembly stage based on the second electrostatic discharge measurement. A potential electrostatic danger condition is determined based on the electrostatic discharge history.


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