The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 10, 2018

Filed:

Mar. 28, 2014
Applicant:

Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, Guangdong, CN;

Inventors:

Rui Xu, Shenzhen, CN;

Weiwei Zhang, Shenzhen, CN;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/31 (2006.01);
U.S. Cl.
CPC ...
G01N 21/31 (2013.01);
Abstract

A device and method for measuring concentration of etchant, the device comprises a concentration measuring mechanism and an acid mist elimination mechanism connected with the concentration measuring mechanism, the acid mist elimination mechanism is configured to eliminate acid mist inside the concentration measuring mechanism, and the concentration measuring mechanism is configured to receive etchant in real time, measure absorbance of each kind of acid of the etchant in a non-acid mist environment, and calculate concentration of each kind of acid of the etchant according to the absorbance. It can overcome the interference of the acid mist on concentration measurement of the acid of the acid mixture etchant. In this way, the concentration of each kind of acid of the acid mixture etchant can be online measured rapidly and accurately, and the desiccative gas can be recycled, which achieves the effect of resource conservation.


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