The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
Mar. 15, 2013
Applicant:
Corning Incorporated, Corning, NY (US);
Inventors:
Robert Alan Bellman, Painted Post, NY (US);
Ta-Ko Chuang, Painted Post, NY (US);
Robert George Manley, Vestal, NY (US);
Mark Alejandro Quesada, Horseheads, NY (US);
Paul Arthur Sachenik, Corning, NY (US);
Assignee:
Corning Incorporated, Corning, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/00 (2006.01); C23C 14/34 (2006.01); C23C 14/10 (2006.01);
U.S. Cl.
CPC ...
C23C 14/34 (2013.01); C23C 14/10 (2013.01);
Abstract
A method of forming a hermetic barrier layer comprises sputtering a thin film from a sputtering target, wherein the sputtering target includes a sputtering material such as a low Tglass, a precursor of a low Tglass, or an oxide of copper or tin. During the sputtering, the formation of defects in the barrier layer are constrained to within a narrow range and the sputtering material is maintained at a temperature of less than 200° C.