The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 10, 2018
Filed:
Oct. 29, 2015
Kba-notasys SA, Lausanne, CH;
Bradley Booth, Melbourne, AU;
KBA-NotaSys SA, Lausanne, CH;
Abstract
There is described a printing press () comprising a printing group () adapted to apply on a substrate at least one ink or varnish vehicle containing magnetic or magnetisable flakes and at least one magnetic orientation unit () located downstream of the printing group () along a path of the substrate, which magnetic orientation unit () includes at least one magnetic-field-inducing device () adapted to orient the magnetic or magnetisable flakes contained in the ink or varnish vehicle applied on the substrate to induce an optically-variable effect in the ink or varnish vehicle. The printing press () further comprises a drying/curing unit () located along the path of the substrate and cooperating with the magnetic orientation unit (), which drying/curing unit () is adapted to dry or cure the ink or varnish vehicle applied on the substrate following orientation of the magnetic or magnetisable flakes. The drying/curing unit () is mounted on a movable supporting structure () that is adapted to move the drying/curing unit () between a working position (WP), where the drying/curing unit () is cooperating with the magnetic orientation unit () and which is located proximate to the path of the substrate next to the magnetic orientation unit (), and a retracted position (RP), where the drying/curing unit () is retracted away from the magnetic orientation unit () and from the path of the substrate.