The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2018
Filed:
Aug. 18, 2016
Kevin A. Boulais, La Plata, MD (US);
Thomas L. Wilson, King George, VA (US);
Kevin A. Boulais, La Plata, MD (US);
Thomas L. Wilson, King George, VA (US);
The United States of America as represented by the Secretary of the Navy, Washington, DC (US);
Abstract
Chaff is provided for deployment from an aerial platform for retro-reflecting electromagnetic radiation projected to the platform. The chaff includes a plurality of retro-reflecting particles, with each particle being a retro-reflector. The plurality forms a cloud having aerial buoyancy. The particles can be a corner reflector with adjacent sides substantially perpendicular to one another, and in particular a trihedral corner reflector. Alternatively, the particles can be lens reflectors, such as a cat's eye. In addition, chaff is provided for deployment from an aerial platform for retro-reflecting electromagnetic radiation projected to the platform. The chaff includes a plurality of retro-reflecting particles and a substrate. Each particle of the plurality is a retro-reflector. The substrate attaches the plurality of particles.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile