The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 03, 2018

Filed:

Mar. 20, 2014
Applicant:

Leica Microsystems Cms Gmbh, Wetzlar, DE;

Inventors:

Werner Knebel, Kronau, DE;

Wernher Fouquet, Mannheim, DE;

Frank Sieckmann, Eppingen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 21/06 (2006.01); G02B 21/32 (2006.01); G02B 21/00 (2006.01); G02B 21/16 (2006.01); G02B 21/36 (2006.01); G02B 26/08 (2006.01);
U.S. Cl.
CPC ...
G02B 21/32 (2013.01); G02B 21/0032 (2013.01); G02B 21/0076 (2013.01); G02B 21/16 (2013.01); G02B 21/367 (2013.01); G02B 26/0816 (2013.01);
Abstract

A method, in which a sample is manipulated with manipulation light, includes imaging the sample using a single plane illumination microscopy SPIM technique under illumination with illumination light being an illumination light sheet of fluorescent excitation light. Both the manipulation light and the illumination light are focused by an objective brought to an objective working position. Either the manipulation light or the illumination light are diverted after passing through the objective by use of a diverting device to propagate the manipulation light or the illumination light at an angle different from zero degrees with respect to an optical axis of the objective.


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