The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2018
Filed:
Dec. 17, 2013
Applicant:
Hitachi, Ltd., Tokyo, JP;
Inventors:
Keisuke Shibuya, Tokyo, JP;
Ryoichi Haga, Tokyo, JP;
Masaru Namba, Tokyo, JP;
Kenichiro Oka, Tokyo, JP;
Ken Amano, Tokyo, JP;
Assignee:
HITACHI, LTD., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C12M 1/34 (2006.01); C12M 1/06 (2006.01); C12M 1/42 (2006.01); C12M 1/12 (2006.01); C12M 1/36 (2006.01);
U.S. Cl.
CPC ...
C12M 41/42 (2013.01); C12M 25/02 (2013.01); C12M 27/02 (2013.01); C12M 35/04 (2013.01); C12M 41/32 (2013.01); C12M 41/48 (2013.01);
Abstract
This invention provides a culture control method and a cell culture apparatus that enable stable cell culture by regulating shear stress to be applied to cells within an adequate range. With the application of such culture control method and cell culture apparatus, cell culture is performed under agitation culture conditions in which the shear stress distribution is 0.5 Pa to 20 Pa in 80% or more of the culture vessel by volume.