The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2018
Filed:
Dec. 15, 2014
Applicant:
Arkema France, Colombes, FR;
Inventors:
Assignee:
Arkema France, Colombes, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 297/02 (2006.01); B82Y 30/00 (2011.01); C09D 153/00 (2006.01); G03F 7/00 (2006.01); B82Y 40/00 (2011.01); C08J 5/18 (2006.01);
U.S. Cl.
CPC ...
C08F 297/026 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C08J 5/18 (2013.01); C09D 153/00 (2013.01); G03F 7/0002 (2013.01); C08J 2353/00 (2013.01); Y10S 438/945 (2013.01); Y10S 524/905 (2013.01); Y10S 525/915 (2013.01);
Abstract
The invention relates to a block copolymer film nanostructured in nanodomains at a predetermined temperature, obtained from a basic block copolymer which is nonstructured at said predetermined temperature, and at least one block of which comprises styrene and at least another block of which comprises methyl methacrylate. The block copolymer film is useful for forming nano-lithography masks.