The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2018
Filed:
Mar. 12, 2014
Heraeus Quarzglas Gmbh & Co. KG, Hanau, DE;
Klaus-Uwe Badeke, Petersberg-Sennewitz, DE;
Martin Trommer, Bitterfeld, DE;
Heraeus Quarzglas GmbH & Co. KG, Hanau, DE;
Abstract
A method for manufacturing quartz glass, wherein (a) an appropriate liquid starting material is evaporated by spraying it into a vertically arranged evaporation chamber, (b) the vaporous starting material is oxidized to form SiO, and the SiOis collected. The method is characterized in that the starting material to be evaporated is sprayed in on the bottom of the evaporation chamber and the vaporous starting material is removed at the top end of the evaporation chamber, wherein the evaporation chamber is designed such that components depositing in the chamber accumulate on the bottom of the evaporator and are sprayed once again, as well as an evaporator for applying the method.