The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2018
Filed:
Feb. 18, 2015
Koninklijke Philips N.v., Eindhoven, NL;
Peter Dirksen, Valkenswaard, NL;
Ruediger Mauczok, Erkelenz, DE;
Koray Karakaya, Eindhoven, NL;
Johan Hendrik Klootwijk, Eindhoven, NL;
Bout Marcelis, Eindhoven, NL;
Marcel Mulder, Eindhoven, NL;
Koninklijke Philips N.V., Eindhoven, NL;
Abstract
The present invention relates to a method of manufacturing a capacitive micro-machined transducer (), in particular a CMUT, the method comprising depositing a first electrode layer () on a substrate (), depositing a first dielectric film () on the first electrode layer (), depositing a sacrificial layer () on the first dielectric film (), the sacrificial layer () being removable for forming a cavity () of the transducer, depositing a second dielectric film () on the sacrificial layer (), and depositing a second electrode layer () on the second dielectric film (), wherein the first dielectric film () and/or the second dielectric film () comprises a first layer comprising an oxide, a second layer comprising a high-k material, and a third layer comprising an oxide, and wherein the depositing steps are performed by Atomic Layer Deposition. The present invention further relates to a capacitive micro-machined transducer (), in particular a CMUT, manufactured by such method.