The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2018

Filed:

Apr. 19, 2017
Applicant:

Huawei Technologies Co., Ltd., Shenzhen, CN;

Inventor:

Jia Jiang, Kanata, CA;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 6/26 (2006.01); G02B 6/134 (2006.01); G02B 6/30 (2006.01); G02B 6/122 (2006.01); G02B 6/12 (2006.01); C23C 14/48 (2006.01); C23C 14/04 (2006.01); C23C 14/18 (2006.01); C23C 14/54 (2006.01); C23C 14/58 (2006.01);
U.S. Cl.
CPC ...
G02B 6/1342 (2013.01); C23C 14/042 (2013.01); C23C 14/18 (2013.01); C23C 14/48 (2013.01); C23C 14/541 (2013.01); C23C 14/542 (2013.01); C23C 14/584 (2013.01); C23C 14/5873 (2013.01); G02B 6/12004 (2013.01); G02B 6/1228 (2013.01); G02B 6/305 (2013.01);
Abstract

A method of fabricating an optical coupling device, comprising forming a waveguide mask layer on a substrate platform, wherein the waveguide mask layer comprises an array of openings comprising a first end and a second end opposite to the first end, immersing the substrate platform into a salt melt comprising ions to form an array of waveguides in the substrate platform through an ion diffusion process, and controlling a rate of immersion such that a diffusion depth of the ions varies as a function of a distance in a direction from the first end to the second end, wherein the array of waveguides extends in the direction from the first end to the second end.


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