The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2018
Filed:
Nov. 13, 2015
Fujifilm Corporation, Tokyo, JP;
Miho Asahi, Kanagawa, JP;
Takayasu Yamazaki, Kanagawa, JP;
Kenichi Fukuda, Kanagawa, JP;
Shuntaro Ibuki, Kanagawa, JP;
FUJIFILM CORPORATION, Tokyo, JP;
Abstract
The invention is to provide a antireflective film having a moth-eye structure, which has sufficient antireflective performances, which exhibits excellent planar uniformity, and which can be manufactured by a simple method; a polarizing plate, a cover glass, and an image display device that have the antireflective film; a method for producing the antireflective film; a cloth for cleaning the antireflective film; a kit including the antireflective film and the cleaning cloth; and a method for cleaning the antireflective film. The invention provides a antireflective film which includes a plastic substrate; a infiltration layer; a antireflective layer including a binder resin and particles with an average primary particle diameter of 50 nm to 700 nm, in this order in an adjacent manner, in which the antireflective layer has moth-eye structures formed by the particles on the surface opposite to the infiltration layer.