The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2018

Filed:

Apr. 14, 2016
Applicant:

Samsung Display Co., Ltd., Yongin-si, Gyeonggi-do, KR;

Inventors:

Junghan Seo, Yongin-si, KR;

Sungmin Hur, Yongin-si, KR;

Gyoseung Ku, Yongin-si, KR;

Hyungjong Lee, Yongin-si, KR;

Assignee:

Samsung Display Co., Ltd., Yongin-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 16/04 (2006.01); C23C 16/458 (2006.01); C23C 16/50 (2006.01); C23C 16/455 (2006.01); H01J 37/32 (2006.01); H01L 51/00 (2006.01);
U.S. Cl.
CPC ...
C23C 16/042 (2013.01); C23C 16/455 (2013.01); C23C 16/458 (2013.01); C23C 16/50 (2013.01); H01J 37/3244 (2013.01); H01J 37/32366 (2013.01); H01L 51/0008 (2013.01);
Abstract

A plasma-enhanced chemical vapor deposition device includes: a sprayer to spray a gas onto a substrate; a lift to support a mask including a pattern through which the gas to be sprayed by the sprayer passes, and to raise or lower the mask; and a susceptor to support the substrate on which the gas to be passed through the mask is to be deposited, and to raise or lower the substrate, wherein the susceptor includes a first ground to electrically contact the mask during a deposition process during which the gas is deposited on the substrate.


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