The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 26, 2018
Filed:
Feb. 09, 2015
Applicant:
Cheorwon Plasma Research Institute, Gangwon-do, KR;
Inventors:
Steven Kim, Seoul, KR;
Deuk Yeon Lee, Gyeonggi-do, KR;
Hae Shin Lee, Daejeon, KR;
Young Chang Seo, Daejeon, KR;
Assignee:
CHEORWON PLASMA RESEARCH INSTITUTE, Gangwon-Do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 215/52 (2006.01); C07C 215/60 (2006.01); C07C 213/02 (2006.01); C07C 213/00 (2006.01); C07C 223/02 (2006.01);
U.S. Cl.
CPC ...
C07C 215/52 (2013.01); C07C 213/00 (2013.01); C07C 213/02 (2013.01); C07C 215/60 (2013.01); C07C 223/02 (2013.01);
Abstract
A method is provided for preparing a catecholamine-based compound by using plasma polymerization, and more specifically, to a method for artificially synthesizing various catecholamines, that is, monomolecular compounds capable of having a hydroxyl group (—OH) as an ortho group of a benzene ring and various alkylamines as a para group thereof from a catecholamine precursor material such as phenol or aniline by using dry plasma polymerization.