The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 26, 2018

Filed:

Jun. 04, 2014
Applicant:

Konica Minolta, Inc., Tokyo, JP;

Inventors:

Naoki Yamamoto, Toyohashi, JP;

Kanji Nakayama, Toyokawa, JP;

Keita Saito, Toyokawa, JP;

Dai Suwama, Toyokawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 15/20 (2006.01); B81C 3/00 (2006.01);
U.S. Cl.
CPC ...
B81C 3/005 (2013.01); B81C 2203/032 (2013.01); H01L 2224/95146 (2013.01);
Abstract

There is provided a method of manufacturing a pattern substrate in which a pattern is formed on the surface of the substrate. The manufacturing method includes a step of preparing the substrate and a step of arranging a liquid-repellent or lyophilic material on the surface of the substrate so as to form the pattern on the surface of the substrate in which the surface of the substrate has a liquid-repellent region and a lyophilic region, the pattern is formed by one of the liquid-repellent region and the lyophilic region and the pattern is used to locate a component by the surface tension of a liquid member.


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