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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10002785 B1

PDFFull Text
Date of Patent:
Jun. 19, 2018

Filed:

Jun. 10, 2015

Air-gap assisted etch self-aligned dual damascene

Applicant:

Microchip Technology Incorporated, Chandler, AZ (US);

Inventors:

Justin Hiroki Sato, West Linn, OR (US);

Andrew Alexander Taylor, Portland, OR (US);

Assignee:

MICROCHIP TECHNOLOGY INCORPORATED, Chandler, AZ (US);

Attorney:

Slayden Grubert Beard PLLC

Primary Examiner:

Phat X Cao

Assistant Examiner:

Victor Barzykin

Int. Cl.
CPC ...
H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76813 (2013.01); H01L 21/76807 (2013.01); H01L 21/76843 (2013.01); H01L 21/76871 (2013.01); H01L 2221/1031 (2013.01);
Abstract

A semiconductor process for providing a metal layer uses the following steps: A barrier dielectric layer is deposited on a semiconductor layer comprising an exposed metal line. A via layer is formed on top of the barrier dielectric layer comprising at least one via. A non-conformal film is deposited on top of the via layer thereby forming a void in the at least one via, and at least one trench is etched into the non-conformal film thereby opening the void, and creating a dual-damascene layer.

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Quick Actions:

Sato, Justin. (2018). Air-gap assisted etch self-aligned dual damascene (U.S. Patent No. 10002785). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10002785

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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