The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 19, 2018
Filed:
Aug. 15, 2016
Boe Technology Group Co., Ltd., Beijing, CN;
Chongqing Boe Optoelectronics Technology Co., Ltd., Chongqing, CN;
Qiang Xiong, Beijing, CN;
Hongjiang Wu, Beijing, CN;
Ruilin Bi, Beijing, CN;
Hongyu Sun, Beijing, CN;
Zili Han, Beijing, CN;
Yuanhong Peng, Beijing, CN;
Min Li, Beijing, CN;
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., Chongqing, CN;
Abstract
The present disclosure provides a mask assembly, a color filter substrate and a method of manufacturing the same. The mask assembly includes: a first mask formed with a plurality of first black matrix marking mask patterns at a position corresponding to each marking region, a spacing between centers of two first black matrix marking mask patterns that are the closest to each other among the first black matrix marking mask patterns being not less than two times of a spacing between centers of two adjacent sub-pixels located in a same row; and a second mask formed with a plurality of photoresist block mask patterns at a position corresponding to the color filtering region, and further formed with at least two photoresist marking mask patterns, which are located at a position corresponding to each marking region and arranged in a column direction.