The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 19, 2018

Filed:

Dec. 30, 2014
Applicant:

Kolon Industries, Inc., Gwacheon-si, KR;

Inventors:

Yun-Jo Kim, Yongin-si, KR;

Si-Min Kim, Yongin-si, KR;

Dong-Hyeon Choi, Yongin-si, KR;

Dong-Jin Kim, Yongin-si, KR;

Assignee:

KOLON INDUSTRIES, INC., Gwacheon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B32B 7/00 (2006.01); B29C 47/70 (2006.01); B32B 27/08 (2006.01); B32B 27/18 (2006.01); B60C 5/14 (2006.01); B32B 7/02 (2006.01); B32B 27/00 (2006.01); B32B 27/28 (2006.01); B32B 27/34 (2006.01); B32B 1/00 (2006.01); B32B 3/00 (2006.01); B29C 47/06 (2006.01); B29D 30/06 (2006.01); B29C 47/00 (2006.01); B29K 21/00 (2006.01); B29K 71/00 (2006.01); B29K 77/00 (2006.01); B29L 30/00 (2006.01);
U.S. Cl.
CPC ...
B29C 47/707 (2013.01); B29C 47/0004 (2013.01); B29C 47/0021 (2013.01); B29C 47/065 (2013.01); B29D 30/0681 (2013.01); B32B 1/00 (2013.01); B32B 3/00 (2013.01); B32B 7/00 (2013.01); B32B 7/02 (2013.01); B32B 27/00 (2013.01); B32B 27/08 (2013.01); B32B 27/18 (2013.01); B32B 27/28 (2013.01); B32B 27/285 (2013.01); B32B 27/286 (2013.01); B32B 27/34 (2013.01); B60C 5/14 (2013.01); B29C 47/0019 (2013.01); B29D 2030/0682 (2013.01); B29K 2021/00 (2013.01); B29K 2071/00 (2013.01); B29K 2077/00 (2013.01); B29L 2030/008 (2013.01); B32B 2250/00 (2013.01); B32B 2250/24 (2013.01); B32B 2250/40 (2013.01); B32B 2274/00 (2013.01); B32B 2307/552 (2013.01); B32B 2307/554 (2013.01); B32B 2307/718 (2013.01); B32B 2307/7242 (2013.01); B32B 2307/734 (2013.01); B32B 2605/00 (2013.01); B32B 2605/08 (2013.01); B60C 2005/145 (2013.01);
Abstract

The present invention relates to: a method for manufacturing a polymer film, the method including a base film forming step for co-extruding a first resin containing a polyamide-based resin and a second resin containing a copolymer including polyamide-based segments and polyether-based segments; a co-extruded film including a base film including a first resin layer containing a polyamide-based resin, and a second resin layer containing a copolymer having polyamide-based segments and polyether-based segments; to a co-extruded film including a base film including a first resin layer and a second resin layer, which have different melting points; and to a method for manufacturing a polymer film, the method including a base film forming step including a step of co-extruding a first resin and a second resin, which have different melting points.


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