Shanghai, China

Zhichao Fang


Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2022-2025

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2 patents (USPTO):Explore Patents

Title: Zhichao Fang: Innovator in Porous-Structure Devices

Introduction

Zhichao Fang is a notable inventor based in Shanghai, China. He has made significant contributions to the field of engineering, particularly in the development of innovative devices designed to suppress wave run-up. With a total of 2 patents, his work reflects a deep understanding of both theoretical and practical aspects of his field.

Latest Patents

One of Zhichao Fang's latest patents is a porous-structure device for suppressing wave run-up, along with its design method. This device features a semi-submersible platform that consists of four columns, two pontoons, two horizontal supports, and a deck. The design includes fillets on the middle portions of the columns with a square section, where the radius of the fillets gradually decreases to 0 near the deck and pontoons. Additionally, a porous device is positioned outside each column, formed by combining and connecting four single components. Each single component consists of multiple porous laminated plates and connecting pieces. The parameters of the porous laminated plates, such as pore type, porosity, number of layers, interlayer spacing, and installation height, are tailored according to the wave characteristics in various sea areas.

Career Highlights

Zhichao Fang has worked at prestigious institutions, including Shanghai Jiaotong University and the Shenzhen Branch of Wuxi Shangbai Global E-commerce Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to significant advancements in his field.

Collaborations

Zhichao Fang has collaborated with notable colleagues, including Longfei Xiao and Haobo Li. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas.

Conclusion

Zhichao Fang is a distinguished inventor whose work in porous-structure devices showcases his expertise and commitment to advancing engineering solutions. His contributions are paving the way for future innovations in wave suppression technology.

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