Hsinchu, Taiwan

Ying-Hao Hsieh

USPTO Granted Patents = 1 

Average Co-Inventor Count = 8.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Innovations of Ying-Hao Hsieh in Semiconductor Technology

Introduction

Ying-Hao Hsieh is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work is recognized within the industry, and he is associated with Taiwan Semiconductor Manufacturing Company Limited.

Latest Patents

Ying-Hao Hsieh holds a patent for a "Method of fabricating a source/drain recess in a semiconductor device." This invention involves a device that includes a gate stack over a semiconductor substrate, featuring a pair of spacers abutting the sidewalls of the gate stack. A recess is formed in the semiconductor substrate adjacent to the gate stack, which has a unique profile. The first profile has substantially vertical sidewalls, while the second profile is contiguous with and below the first profile. This design creates a bottle-neck shaped profile of the recess, with the second profile having a greater width within the semiconductor substrate than the first profile. The recess is filled with a semiconductor material, and a pair of spacers are positioned over the semiconductor substrate adjacent to the recess.

Career Highlights

Ying-Hao Hsieh has established himself as a key figure in the semiconductor industry. His work at Taiwan Semiconductor Manufacturing Company Limited has allowed him to contribute to advancements in semiconductor fabrication techniques. His innovative approach has garnered attention and respect from his peers.

Collaborations

Ying-Hao Hsieh has collaborated with notable colleagues, including Eric Peng and Chao-Cheng Chen. These collaborations have further enhanced his contributions to the field and have fostered a productive working environment.

Conclusion

Ying-Hao Hsieh's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the industry. His work continues to influence the development of semiconductor devices, showcasing the importance of innovation in technology.

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