Anjo, Japan

Takashi Taguchi


Average Co-Inventor Count = 3.6

ph-index = 6

Forward Citations = 147(Granted Patents)


Location History:

  • Okazaki, JP (1984 - 1986)
  • Anjo, JP (1994 - 2000)

Company Filing History:


Years Active: 1984-2000

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6 patents (USPTO):Explore Patents

Title: Takashi Taguchi: Innovator in Semiconductor Technology

Introduction

Takashi Taguchi is a prominent inventor based in Anjo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His work focuses on enhancing the performance and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is for an InP-based HEMT with a superlattice carrier supply layer. This semiconductor device features a semi-insulating substrate and a channel layer formed on it. An electron supply layer generates a two-dimensional electron gas, which includes a doped superlattice layer. The superlattice layer alternates between layers of In.sub.X Al.sub.1-X As and In.sub.Y Al.sub.1-Y As, where the values of X and Y differ. Another notable patent involves a compound semiconductor substrate with a hetero-junction, designed to prevent the concentration of the two-dimensional electron gas in the channel layer near the hetero-interface. This innovative structure allows for a reduction in the thickness of the channel layer while maintaining high mobility.

Career Highlights

Throughout his career, Takashi Taguchi has worked with several notable companies, including Nippon Soken, Inc. and Nippondenso Co., Ltd. His expertise in semiconductor technology has made him a valuable asset in these organizations.

Collaborations

Takashi has collaborated with esteemed colleagues such as Yoshiki Ueno and Tadashi Hattori. Their combined efforts have contributed to advancements in semiconductor research and development.

Conclusion

Takashi Taguchi's innovative work in semiconductor technology has led to significant advancements in the field. His patents reflect a deep understanding of materials and structures that enhance device performance. His contributions continue to influence the industry and inspire future innovations.

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