Montlaur, France

Stéphane Orieux

USPTO Granted Patents = 1 

 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2023

Loading Chart...
Loading Chart...
1 patent (USPTO):Explore Patents

Title: Stéphane Orieux: Innovator in Supersonic Ejector Technology

Introduction

Stéphane Orieux is a notable inventor based in Montlaur, France. He has made significant contributions to the field of fluid dynamics, particularly with his innovative designs in ejector technology. His work has implications for various applications, including vacuum generation.

Latest Patents

Stéphane Orieux holds a patent for a "Supersonic ejector with annular chamber." This invention features a Venturi type ejector that includes a feed duct for feeding fluid under pressure, extending along a central axis. The design incorporates a first expansion chamber connected to the feed duct, a first mixing chamber linked to the expansion chamber, a first suction chamber associated with the mixing chamber, and an exhaust chamber connected to the first mixing chamber. The ejector allows fluid under pressure to penetrate into the first expansion chamber from multiple directions, extending in a plane that is substantially orthogonal to the central axis. This innovative ejector is integral to a vacuum generator.

Career Highlights

Throughout his career, Stéphane Orieux has worked with reputable organizations, including Coval and the National Institute of Applied Sciences of Toulouse. His experience in these institutions has contributed to his expertise in fluid dynamics and ejector technology.

Collaborations

Stéphane has collaborated with notable colleagues such as Lucien Baldas and Loïc Joguet. Their combined efforts have further advanced the field of ejector technology.

Conclusion

Stéphane Orieux is a distinguished inventor whose work in supersonic ejector technology has made a significant impact in the field of fluid dynamics. His innovative designs and collaborations continue to influence advancements in vacuum generation and related applications.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…