Yamanashi, Japan

Shigeru Hagihara


Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 7(Granted Patents)


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Shigeru Hagihara: Innovator in Zinc Oxide Thin Film Technology

Introduction

Shigeru Hagihara is a notable inventor based in Yamanashi, Japan. He has made significant contributions to the field of materials science, particularly in the development of methods for manufacturing zinc oxide thin films. His innovative approach has implications for various applications, including electronics and optoelectronics.

Latest Patents

Hagihara holds a patent for a "Method and apparatus for manufacturing a zinc oxide thin film at low temperatures." This invention provides a technique for forming a zinc oxide thin film with high transparency and conductivity on flexible substrates, such as plastic, without the need for doping impurities. The method involves reacting oxygen radicals and zinc atoms in a vacuum chamber, where the substrate temperature is controlled to manage the density of crystal defects in the thin film. This process allows for the formation of the film while maintaining the substrate temperature at 400°C or less, intentionally disturbing the atomic arrangement to achieve desired properties.

Career Highlights

Throughout his career, Shigeru Hagihara has been associated with Yamanashi University and Yamanashi Prefecture. His work has been instrumental in advancing the understanding and application of zinc oxide thin films in various technological fields. His research has garnered attention for its innovative approach and practical applications.

Collaborations

Hagihara has collaborated with notable colleagues, including Takashi Matsumoto and Chitake Imazu. These collaborations have contributed to the advancement of research in materials science and have fostered a productive exchange of ideas.

Conclusion

Shigeru Hagihara's contributions to the field of zinc oxide thin film technology highlight his innovative spirit and dedication to advancing materials science. His patent and collaborative efforts reflect a commitment to developing practical solutions for modern technological challenges.

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