Shenjian Liu

Title: Innovations by Shenjian Liu: Pioneering Plasma Reactor Technologies

Introduction: Shenjian Liu, an accomplished inventor based in Shanghai, CN, has made significant contributions to the field of plasma technology with a total of three patents to his name. His innovative work focuses on enhancing plasma process apparatuses, emphasizing low particle contamination for improved efficiency in semiconductor manufacturing.

Latest Patents: Among his latest creations is a groundbreaking plasma reactor that features a variable coupling of low-frequency RF power to an annular electrode. This reactor design integrates an electrically conductive base connected to an RF source via a matching network, along with an electrostatic chuck for precise wafer handling. The reactor enhances performance through a plasma-resistant dielectric layer and a focus ring design that optimizes plasma exposure.

Another notable patent by Liu outlines a plasma process apparatus that significantly reduces particle contamination. This invention consists of a chamber body, liner, and dielectric window that together enclose a reaction space to maintain a low-pressure environment. A sophisticated shutter mechanism prevents contamination particles from entering the reaction space during wafer transfers, enabling a cleaner and more efficient production process.

Career Highlights: Liu's expertise is exemplified at Advanced Micro-fabrication Equipment Inc. China, where his innovative ideas and designs play a crucial role in advancing the company's technological capabilities in micro-fabrication equipment. His dual focus on functionality and contamination reduction showcases his commitment to producing high-quality solutions for the semiconductor industry.

Collaborations: In his pursuit of innovation, Shenjian Liu collaborates closely with esteemed colleagues, including Tuqiang Q Ni and Rason Zuo. Their combined expertise fosters a synergistic environment, allowing for the development of cutting-edge technologies that meet the demands of an evolving market.

Conclusion: Shenjian Liu's contributions to plasma technology through his patents signify meaningful advancements in semiconductor processing. His innovative spirit and collaborative efforts at Advanced Micro-fabrication Equipment Inc. China underscore his importance in the field, paving the way for cleaner and more efficient manufacturing processes.