Seoul, South Korea

Sang Rok Hah


Average Co-Inventor Count = 3.3

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2003-2005

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2 patents (USPTO):Explore Patents

Title: Innovations of Sang Rok Hah in Semiconductor Manufacturing

Introduction

Sang Rok Hah is a notable inventor based in Seoul, South Korea, recognized for his contributions to the field of semiconductor manufacturing. With a total of two patents to his name, Hah has made significant advancements in chemical mechanical polishing (CMP) processes, which are crucial for the production of semiconductor devices.

Latest Patents

Hah's latest patents include a slurry composition for use in chemical mechanical polishing of metal wiring. This invention discloses slurry compositions that comprise a peroxide, an inorganic acid, a propylenediaminetetraacetate (PDTA)-metal complex, a carboxylic acid, a metal oxide powder, and de-ionized water. The PDTA-metal complex plays a major role in enhancing overall polishing performance and reproducibility by preventing abraded tungsten oxide from re-adhering to the polished surface. Additionally, it improves the dispersion stability of the slurry composition.

Another significant patent is related to non-selective slurries for chemical mechanical polishing of metal layers and the method for manufacturing them. This invention provides a slurry that polishes a metal layer, a barrier layer, and an insulating layer simultaneously, maintaining a pH range from weak acidity to weak alkalinity. The method includes a first oxidizing agent that reduces a second oxidizing agent, which is recycled to maintain its oxidizing power. This innovative approach allows for a flat finish on the insulating layer where a plug is formed, as it ensures equal polishing removal rates for all layers involved.

Career Highlights

Sang Rok Hah has worked with prominent companies in the semiconductor industry, including Samsung Electronics Co., Ltd. and Cheil Industries Inc. His experience in these organizations has contributed to his expertise in developing advanced polishing techniques and materials.

Collaborations

Hah has collaborated with notable coworkers such as Jong Won Lee and Jae Seok Lee, further enhancing his work in the field of semiconductor manufacturing.

Conclusion

Sang Rok Hah's innovative patents and career in semiconductor manufacturing highlight his significant contributions to the industry. His work continues to influence the development of efficient and effective polishing processes in semiconductor device production.

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