Ryota Furukawa

Title: Ryota Furukawa: Innovator in Plasma Processing Technologies

Introduction

Ryota Furukawa is a notable inventor based in Osaka, Japan. He has made significant contributions to the field of plasma processing technologies, holding 2 patents that showcase his innovative approaches. His work primarily focuses on methods for producing element chips and improving substrate processing techniques.

Latest Patents

Furukawa's latest patents include a method for producing element chips. This method involves several steps, including preparing a substrate held on a holding sheet supported by a frame, forming a protective film, and utilizing plasma dicing to individualize the substrate into multiple element chips. Another patent details a plasma processing method for substrates, which employs a specialized tray to enhance product quality by removing by-products during the plasma processing stages.

Career Highlights

Ryota Furukawa is currently associated with Panasonic Intellectual Property Management Co., Ltd. His work at this company has allowed him to develop and refine his innovative techniques in plasma processing, contributing to advancements in the field.

Collaborations

Furukawa has collaborated with notable coworkers, including Shogo Okita and Toshiyuki Takasaki. These collaborations have likely fostered a creative environment that encourages the development of cutting-edge technologies.

Conclusion

Ryota Furukawa's contributions to plasma processing technologies reflect his dedication to innovation and excellence. His patents not only enhance the production of element chips but also improve the overall quality of substrate processing.