Renbiao Xie

Title: Renbiao Xie: Innovator in Exposure Technology

Introduction

Renbiao Xie is a notable inventor based in Shanghai, China. He has made significant contributions to the field of exposure technology, particularly in the design of exposure apparatuses. His innovative approach has led to advancements that enhance the efficiency and effectiveness of wafer exposure processes.

Latest Patents

Renbiao Xie holds a patent for an exposure apparatus and method. This apparatus includes an exposure unit designed for exposing a wafer, which features an illumination system and masks. The illumination system incorporates a light-homogenizing unit, which consists of a light-homogenizing quartz rod with a regular hexagonal cross-section. Each mask is shaped to match this cross-section, resulting in a field of exposure that is less affected by objective field of view distortion. This design allows for a higher useful depth of focus (UDoF) compared to other exposure fields of the same size. Furthermore, with the same projection objective depth of focus, a greater field of exposure can be achieved.

Career Highlights

Throughout his career, Renbiao Xie has worked with prominent companies in the microelectronics sector. He has been associated with Shanghai Micro Electronics Equipment (Group) Co., Ltd. and Shanghai Micro Electronics Equipment Co., Ltd. His work in these organizations has contributed to the advancement of microelectronics technology.

Collaborations

Renbiao Xie has collaborated with several professionals in his field, including Zhiyong Yang and Angli Bai. These collaborations have fostered innovation and development in exposure technology.

Conclusion

Renbiao Xie's contributions to exposure technology through his innovative patent and career in microelectronics highlight his role as a significant inventor. His work continues to influence the industry and pave the way for future advancements.