Rasirc, Inc.

Zohreh Shamsi

Jeffrey J Spiegelman

Russell J Holmes

Daniel Alvarez, Jr

Edward Heinlein

James John Hogan

Christopher Ramos

Douglas Shepherd

Alex Deptala

Daniel Alvarez

Alexander Deptala

Provided herein are methods, systems, and device for control, delivery, and purification of low vapor pressure gases in conjunction with carrier gas in micro-electronics and other critical process applications. The present invention is based on the observation that when temperature and pressure of a device for delivering a gas stream are held constant, the concentration of vapor in the gas stream may be modulated based on the level of liquid within the chamber thereof.

Controlled vapor delivery into low pressure processes

Methods for the gas-phase delivery of gases, such as process gases, from the gas phase of a multicomponent source liquid are provided. The methods are generally directed to the generation of process gases having mass flow rates which are proportional to the input power delivered to the multicomponent source liquid containers. The methods may be used to deliver process gases to critical process applications.

Methods and systems for generating process gases

Methods and delivery systems for providing a gas phase of a multi-component liquid source for delivery to a critical process application are provided. The methods include concentration of a component of the liquid source which is less volatile than water for delivery of a gas stream comprising the less volatile component to a critical process application. Critical process applications include decontamination and microelectronic processing applications.

Methods and systems for delivering process gases to critical process applications

A method and chemical delivery system are provided. The method includes providing a vapor phase of a multi-component liquid source. The method further includes contacting a pre-loaded carrier gas with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the multi-component liquid source and delivering a gas stream comprising at least one component of the liquid source to a critical process or application, wherein the amount of the component in the carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant. The chemical delivery system includes a multi-component liquid source having a vapor phase. The system further includes a pre-loaded carrier gas source that is in fluid contact with the vapor phase, wherein the pre-loaded carrier gas includes a carrier gas and at least one component of the liquid source and an apparatus for delivering a gas stream including at least one component of the liquid source, wherein the amount of the component in the pre-loaded carrier gas is sufficient to keep the ratio of components in the multi-component liquid source relatively constant.

Method of delivering a process gas from a multi-component solution

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San Diego, CA, United States of America

Zohreh Shamsi