Beijing Boe Optoelectronics Technology Co., Ltd.

Boe Technology Group Co., Ltd.

Ziqi Xia

Zhinan Zhang

Meihua Hong

Lei Zhang

Lei Chen

Fengguo Wang

Wukun Dai

Jiapeng Li

Miao Qiu

Xiuhong Jin

A surface planarization method of thin film and a preparing method of an array substrate relate to a display field, and can solve the technical problem that the conventional dry etching severely damages the surface flatness of other film layers below the one being etched, thereby improving the display properties of the LCD. The preparing method of the array substrate comprises patterning a non-metallic layer () by a dry etching. And following the step of patterning a non-metallic layer () by the dry etching, the method further comprises performing surface planarization on a first film layer () to recover the first film layer () with a rough surface caused by the dry etching to be planar. The first film layer () is located below the non-metallic layer ().

Surface planarization method of thin film and preparing method of array substrate

An array substrate comprises data lines, gate lines, thin film transistors and pixel electrodes formed on a base substrate. Pixel units are defined by intersecting the data lines and the gate lines, the thin film transistors are formed at the intersections of the data lines and the gate lines, and the data lines extend across each of the pixel units in the middle of the pixel units. At least two thin film transistors for controlling a same pixel electrode are respectively formed on both sides of the data line in each pixel unit.

Display panel, array substrate and manufacturing method thereof

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Beijing, China

Ziqi Xia