Asml Netherlands B.v.

Koninklijke Philips Corporation N.v.

Asml Holding N.v.

Asml Holding N.v. & Asml Netherlands B.v.

Zhuangxiong Huang

Reinier Theodorus Martinus Jilisen

José Nilton Fonseca Junior

Franciscus Johannes Leonardus Heutz

Marcus Adrianus Van De Kerkhof

Johannes Henricus Wilhelmus Jacobs

Johannes Hubertus Josephina Moors

Frank Staals

Richard Joseph Bruls

Jan Frederik Suijver

Andrey Alexandrovich Nikipelov

Jeroen Herman Lammers

Joseph Harry Lyons

Laurentius Cornelius De Winter

Yang-Shan Huang

Gerben Kooijman

Olav Waldemar Vladimir Frijns

Ferdy Migchelbrink

Mart Kornelis-Jan Te Velde

Jin Lian

Karel Johannes Adrianus Van Den Aker

Edwin Te Sligte

Ronald Peter Albright

Manish Ranjan

Kursat Bal

Job Lipsch

Sander Baltussen

Parham Yaghoobi

Ping Zhou

Karl Robert Umstadter

Alisia Mariska Willems-Peters

Sietse Wijtvliet

Emericus Antoon Theodorus Van Den Akker

Ramo Omerovic

Henricus Anita Jozef Wilhelmus Van De Ven

Fei Liu

Jimi Hendriks

Sjoerd Frans De Vries

Thomas Maarten Raasveld

Eray Uzgören

Vadim Yevgenyevich Joseph Banine

Georgi Nenchev Nenchev

The present invention provides a fluid purging system () for an optical element (), comprising a fluid guiding unit arranged to guide a fluid, provided by a fluid supply system, over at least a curved portion of an optical surface () of the optical element. The fluid guiding unit comprises a fluid inlet and a first nozzle unit () for providing a fluid to the optical surface. The fluid guiding unit being formed by at least a first wall portion () and at least a second wall portion (), wherein the second wall portion being configured to face the optical surface and to follow a contour of the optical surface. The second wall portion comprises a second nozzle unit ().

Fluid purging system

Disclosed is a method for focus measurement of a lithographic process. The method comprises receiving a substrate on which a metrology pattern has been printed with a lithographic apparatus with an illumination pupil, illuminating the metrology pattern with a metrology tool to measure a signal based on radiation scattered by the metrology pattern, and determining or monitoring a focus of the lithographic process based on the measured signal. Position of at least part of the metrology pattern is focus dependent. At least part of the metrology pattern has been printed by the lithography apparatus with an angular asymmetric illumination pupil.

Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method

An apparatus comprising: a radiation receiving apparatus provided with an opening operable to receive radiation from a radiation source through the opening; wherein the radiation receiving apparatus comprises a deflection apparatus arranged to change a trajectory of a particle through the opening arriving at the radiation receiving apparatus.

Lithographic system provided with a deflection apparatus for changing a trajectory of particulate debris

The present invention provides a fluid purging system () for an optical element (), comprising a ring and a fluid supply system (). The ring being formed of a body entirely surrounding the optical element, the ring defining a space () radially inwards thereof and adjacent to the optical element. The ring is formed by at least one first wall portion () and at least one second wall portion (A;B), wherein an average height of the first wall portion is greater than an average height of the second wall portion. The fluid supply system is positioned radially outwards of the ring and configured to supply fluid to pass over the at least one second wall portion to the space.

Fluid purging system, projection system, illumination system, lithographic apparatus, and method

Embodiments herein describe methods, devices, and systems for rupture detection and end-of-life monitoring of dynamic gas lock (DGL) membranes and pupil facet mirrors in lithographic apparatuses. A method for detecting rupture of a dynamic gas lock membrane in a lithographic apparatus includes illuminating the dynamic gas lock membrane with a measurement beam using a radiation source, in which the dynamic gas lock membrane is arranged between a wafer and projection optics of the lithography apparatus, and determining whether any radiation from the measurement beam is reflected from the dynamic gas lock membrane by using reflection collection optics, in which the reflection collection optics are arranged above the dynamic gas lock membrane. A rupture in the dynamic gas lock membrane is detected if no radiation is reflected from the dynamic gas lock membrane. If radiation is reflected from the dynamic gas lock membrane, the dynamic gas lock membrane is not ruptured.

End-of-life monitoring of dynamic gas lock membranes and pupil facet mirrors and detection of membrane rupture in lithographic apparatuses

An apparatus comprising: a position monitoring system configured to determine the position of the substrate with respect to a projection system configured to project a radiation beam through an opening in the projection system and onto a substrate, wherein a component of the position monitoring system is located beneath the projection system in use; and a baffle disposed between the opening and the component.

Lithographic apparatus and related methods

A coffee grinder having a grinding tool () for grinding coffee beans, a motor () for driving the grinding tool (), a stall detector () for detecting a stall condition of the grinding tool () and/or of the motor (), and a reversal unit () configured to temporarily reverse a direction of rotation () of the grinding tool () and/or of the motor () if the stall detector () detects a stall condition. Further, a corresponding coffee grinding method and a coffee machine having a coffee grinder are presented.

Coffee grinder and coffee grinding method

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Eindhoven, Netherlands

Zhuangxiong Huang