View, Inc.

Soladigm, Inc.

Sandia Corporation

Sion Power Corporation

Clearist Inc.

Other

Zhongchun Wang

Anshu A Pradhan

Robert T Rozbicki

John A Shelnutt

Craig J Medforth

Jeremy A Dixon

Paul Phong Nguyen

Eric William Kurman

Mark Kozlowski

Mike Scobey

Chariclea Scordilis-Kelley

Hui Du

Tracy Earl Kelley

Nelson Rob Holcomb

Kathleen E Martin

Yuriy V Mikhaylik

Thomas Weiss

James E Miller

Holger Schneider

Marina Safont-Sempere

David L Coleman

Marina Safont Sempere

Prior electrochromic devices frequently suffer from high levels of defectivity. The defects may be manifest as pin holes or spots where the electrochromic transition is impaired. This is unacceptable for many applications such as electrochromic architectural glass. Improved electrochromic devices with low defectivity can be fabricated by depositing certain layered components of the electrochromic device in a single integrated deposition system. While these layers are being deposited and/or treated on a substrate, for example a glass window, the substrate never leaves a controlled ambient environment, for example a low pressure controlled atmosphere having very low levels of particles. These layers may be deposited using physical vapor deposition.

Fabrication of low defectivity electrochromic devices

Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer, which are in direct contact with one another. The interfacial region contains an ion conducting electronically insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices. In addition to the improved electrochromic devices and methods for fabrication, integrated deposition systems for forming such improved devices are also disclosed.

Electrochromic devices

Electrochemical devices that include porous layers, and associated methods, are generally described. In certain cases, the electrochemical device includes a first layer (e.g., a porous coating containing nanoparticles) between an anode and a separator, and a second layer (e.g., another porous coating containing nanoparticles) between a cathode and the separator. The first layer and/or the second layer may have a relatively high porosity, even after the application of an applied pressure to the electrochemical device. The presence of the first layer and the second layer in the electrochemical device may mitigate the occurrence of certain problematic phenomena during cycling of the electrochemical device.

Electrochemical devices including porous layers

Conventional electrochromic devices frequently suffer from poor reliability and poor performance. Improvements are made using entirely solid and inorganic materials. Electrochromic devices are fabricated by forming an ion conducting electronically-insulating interfacial region that serves as an IC layer. In some methods, the interfacial region is formed after formation of an electrochromic and a counter electrode layer. The interfacial region contains an ion conducting electronically-insulating material along with components of the electrochromic and/or the counter electrode layer. Materials and microstructure of the electrochromic devices provide improvements in performance and reliability over conventional devices. In various embodiments, a counter electrode is fabricated to include a base anodically coloring material and one or more additives.

Articles and methods involving protected electrode structures are generally provided. In some embodiments, a protected electrode structure includes an electrode comprising an alkali metal and a protective structure directly adjacent the electrode. In some embodiments, the protective structure comprises elemental carbon and intercalated ions. In some embodiments, the protective structure is a composite protective structure. The composite structure may comprise an alloy comprising an alkali metal, an oxide of an alkali metal, and/or a fluoride salt of an alkali metal.

Protective layers comprising metals for electrochemical cells

Coatings for components of electrochemical cells (e.g., layers for protecting electrodes) are generally described. Associated compounds, articles, systems, and methods are also generally described.

Coatings for components of electrochemical cells

An electrochromic device is disclosed which has a plurality of layers, including at least one planarizing layer having an upper surface roughness which is less than or equal to half of the upper surface roughness of an underlying layer in contact with a lower surface of the at least one planarizing layer, wherein at least valleys of the underlying layer are filled by the lower surface of the at least one planarizing layer. A method for fabricating the electrochromic device is also disclosed.

Electrochromic devices and method for forming such devices

A precursor solution adapted to provide a metal oxide film, includes: (a) at least one additive selected from a viscosity enhancer, a base, an acid and a wetting agent; (b) structural promoter ions selected from Mn, Ni, Co, Ir, Ru, Cr, Mo, W, Ta, Nb, V, Mo, Zr, V and Ti ions; and (c) at least one solvent. A method for preparing a metal oxide film includes: (a) providing a substrate; and (b) depositing on the substrate the precursor solution of the invention. Metal oxides films, electrochromic devices containing the films and methods for making them are also disclosed.

Electrochromic materials and fabrication methods

Growing community of inventors

Milpitas, CA, United States of America

Zhongchun Wang