Az Electronic Materials USA Corp.

Merck Patent Gmbh

Zhong Xiang

Hengpeng Wu

Ping-Hung Lu

Huirong Yao

Jianhui Shan

Shuji Sue Ding-Lee

Hong Zhuang

Mark O Neisser

Jian Yin

Eleazar B Gonzalez

Joseph E Oberlander

Weihong Liu

Salem K Mullen

PingHung Lu

Aritaka Hishida

Jainhui Shan

Eleazor B Gonzalez

Aritaka Az Electronic Materials KK Hishida

Antireflective coating compositions and related polymers are disclosed.

Antireflective coating compositions

The present invention relates to an antireflective composition comprising a polymer, a thermal acid generator and optionally a crosslinking agent, where the polymer comprises at least one hydrophobic unit (1), at least one chromophore unit (2), at least one unit with a crosslinking site (3) and optionally a unit capable of crosslinking the polymer, where, Rto Rare independently selected from hydrogen and C-Calkyl, Wis a fully or partially fluorinated alkylene group, X is selected from F, H and OH; Wcomprises a chromophore group, and WY comprises a crosslinking site. The invention also relates to a process for using the antireflective coating composition.

Antireflective coating composition and process thereof

The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, where, R, R, and R, are selected from H and C-Calkyl, and R, R, R, R, R, and Rare selected from C-Calkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.

Solvent mixtures for antireflective coating compositions for photoresists

The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.

Antireflective compositions for photoresists

The invention relates to an antireflective coating composition for a photoresist layer comprising a polymer, a crosslinking agent and an acid generator, where the polymer comprises at least one unit of structure 1, where, The invention further relates to a process for imaging the antireflective coating composition.

Antireflective composition for photoresists

The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3, where, Y is a hydrocarbyl linking group of 1 to about 10 carbon atoms, R, R, R' and R&#x2033; are independently hydrogen, hydrocarbyl group of 1 to about 10 carbon atoms, halogen, &#x2014;O(CO)Z, &#x2014;C(CF)Z, &#x2014;C(CF)(CO)OZ, &#x2014;SOCF, &#x2014;(CO)OZ, &#x2014;SOZ, &#x2014;COZ, &#x2014;OZ, &#x2014;NZ, &#x2014;SZ, &#x2014;SOZ, &#x2014;NHCOZ, &#x2014;NZCOZ or &#x2014;SONZ, where Z is H or a hydrocarbyl group of 1 to about 10 carbon atoms, n=1&#x2013;4, X is O, CO, S, COO, CHO, CHCOO, SO, NH, NL, OWO, OW, W, and where L and W are independently hydrocarbyl groups of 1 to about 10 carbon atoms, and m=0&#x2013;3.

The present invention relates to bottom antireflective coating compositions and polymers useful in making such compositions.

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Orlando, FL, United States of America

Zhong Xiang