Shanghai Micro Electronics Equipment (group) Co., Ltd.

Shanghai Micro Electronics Equipment Co., Ltd.

Shanghai Yangtze 3-map Elevator Co., Ltd.

Zhiyong Yang

Chang Jin Zhou

Bing Xu

Yuzhi Li

Jian Wang

Yong Wang

Dan Chen

Xianying Wang

Jun Ming Guan

Xiaoping Li

Yingsheng Li

Linlin Ma

Angli Bai

Shaowen Gao

Wenfeng Sun

Renbiao Xie

Yanmin Cai

Jun Guan

The lithography apparatus includes at least two exposure devices and one substrate device. The substrate device includes a substrate stage and a substrate supported by the substrate stage. The at least two exposure devices are disposed in symmetry to each other above the substrate with respect to a direction for scanning exposure and configured to simultaneously create two exposure fields onto the substrate to expose the portions of the substrate within the exposure fields.

Photoetching apparatus and method

A method for vertical control of a lithography machine includes step 1, prior to a scanning exposure, controlling vertical measurement sensors to measure workpiece to obtain overall surface profile data of the workpiece; step 2, performing a global leveling based on the overall surface profile data of the workpiece; and step 3, during the scanning exposure of each exposure field, measuring a local surface profile of the workpiece in real time by the vertical measurement sensors and controlling at least one of a mask stage, a workpiece stage and a projection objective to move vertically according to a Z-directional height value, an Rx-directional tilt value and an Ry-directional tilt value corresponding to the local surface profile of the workpiece, to compensate for the local surface profile of the workpiece in real time, so that an upper surface of each exposure field coincides with a reference focal plane for the exposure field. This method enables flexible vertical control with high accuracy by providing multiple control options.

Vertical control method for use in lithography machine

An optical measurement device includes: a deformation measurement device for measuring magnitude of deformation of an optical detection platform frame, and a correction module for correcting the position of a substrate carrier and/or the position of an optical detection device according to the magnitude of deformation of the optical detection platform frame, so as to eliminate an error in measurement of mark positions due to deformation of the frame. An optical measurement method is also disclosed.

Optical measurement device and method

An optical measurement device and method are disclosed. A position measurement device is provided with a device for measuring inclinations of an optical detection module () and a substrate carrier () which are measured during movement of the optical detection unit and the substrate carrier. Calculation and correction can be made according to the inclination data and with reference to displacements of the optical detection module () and the substrate carrier () and coordinates of their positions. During measurement for a certain point on the substrate, measured data related to the point is corrected by using the device and the method, which improves measurement precision, thus eliminating a large error caused in measurement for a large-sized substrate ().

Optical measurement device and method with improved measurement precision

A middle-drive type elevator has a lift car, tractor, wire rope, guide pulley and counterweight device. The tractor is installed between the lift car and guide pulley. Both the tractor and guide pulley are disposed above the lift car. The tractor is located below the guide pulley. One end of the wire rope connects to the top of the counterweight device, and the other end connects to the top of the lift car after passing through the guide pulley and a traction wheel on the tractor successively. To make the tractor arranged in the middle, the guide pulley bears the majority of the weight of the lift car and counterweight device, while the tractor only bears the minority of the weight of the lift car and counterweight device. It can effectively reduce the load borne by the tractor and greatly improve the service life of the tractor.

Middle-drive type elevator

An exposure apparatus includes an exposure unit for exposing a wafer. The exposure unit includes an illumination system and masks. The illumination system includes a light-homogenizing unit. The light-homogenizing unit includes a light-homogenizing quartz rod having a regular hexagonal cross section. Each of the masks has a regular hexagonal shape matching with the cross section of the light-homogenizing quartz rod. A field of exposure resulting from this arrangement is less affected by objective field of view distortion and allows a higher useful depth of focus (UDoF) when compared to other fields of exposure of the same size. In addition, with the same projection objective DoF, a greater field of exposure can be obtained.

Exposure apparatus and method

An immersion flow field maintenance system for an immersion lithography machine. The machine includes a projection objective lens, a wafer stage for supporting the wafer, and an immersion supplying system distributed around the lens for producing an immersion flow field under the lens. The system includes a horizontal guideway, a flat board connected with the horizontal guideway through a cantilever, and drivers for moving the board. When the wafer is unloading and the wafer stage is moving out of the exposure area under the lens, the board connects to and moves synchronously with the wafer stage to transfer the flow field from above the wafer stage to above the board. When the wafer is loaded and the wafer stage is moving into the exposure area, the board connects to and moves synchronously with the wafer stage to transfer the flow field from above the board to above the wafer stage.

Immersion flow field maintenance system for an immersion lithography machine

A precise positioning system for dual stage switching exposure, which includes a base, a first wafer stage positioning unit disposed on the base for a pre-processing workstation, and a second wafer stage positioning unit for an exposure workstation. Each of the wafer stage positioning units includes a wafer stage, a motion positioning detector, an X-direction guide bar, and a Y-direction guide bar. The pre-processing workstation and the exposure workstation both have two X-direction guide bars positioned on and movable along the Y-direction guide bars. The X-direction guide bars of adjacent workstations can be connected to each other.

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Shanghai, China

Zhiyong Yang