Cadence Design Systems, Inc.

D2s, Inc.

Zhigang Wu

Takashi Mitsuhashi

Shohei Matsushita

Dmitri Lapanik

Daisuke Hara

Dmitri Lanpanik

Various embodiments of the present invention relate to particle beam writing to fabricate an integrated circuit on a wafer. In various embodiments, cell projection (CP) cell library information is stored in the form of a data structure. Subsequently, the CP cell library information is referenced by a writing system. The patterns are written on the wafer depending on the referenced CP cell library.

Method and system for stencil design for particle beam writing

A system and method for improved electron beam writing that is capable of taking design intent, equipment capability and design requirements into consideration. The system and method determines an optimal writing pattern based, at least in part, on the received information.

System and method of electron beam writing

A method and system for lithography simulation is disclosed. The method and system specify a subject region of a lithography image with a CD marker, specify a threshold intensity over the lithography image, specify a gradient to a threshold value of the threshold intensity, and calculate a sensitivity or ratio of change of an image boundary of the lithography image to lithography process variation.

Growing community of inventors

Yokohama, Japan

Zhigang Wu