Texas Instruments Corporation

Zhicheng Tang

Francis Gabriel Celii

Robert Kraft

Guoqiang Xing

Andrew McKerrow

Kenneth Joseph Newton

Michael Seidl

Jeff A West

Roger Mark Terry

Jun Tang

Andrew Ralston

An apparatus and method for improving data transfers between a network and a network device is provided. The apparatus comprising a data input, a programmable counter adapted to counting the number of data packets received, an interrupt generator for signaling a microprocessor upon a signal from said programmable counter, a data processing block for examining the contents of data packets for an end-of-packet flag, and an output.

Smart interface for payload transfers in networking applications

A dual damascene process flow for forming interconnect lines and vias in which at least part of the via () is etched prior to the trench etch. A low-k material such as a thermoset organic polymer is used for the ILD () and IMD (). After the at least partial via etch, a BARC () is deposited over the structure including in the via (). Then, the trench () is patterned and etched. Although at least some of the BARC () material is removed during the trench etch, the bottom of the via () is protected.

Process flow for dual damescene interconnect structures

A method ( ) of determining a best focus for an integrated circuit stepper ( ). The method repeats various steps for a plurality of different focus levels. The repeated steps include forming a first element group (C ) on a wafer ( ), where the first element group comprises one or more elements and each of the one or more elements in the first element group has a shape. The repeated steps further include defining a first reference point (C ) for the first element group at a position relative to the shape of the one or more elements in the first element group. Similarly, the repeated steps include forming a second element group (C ) on the wafer, where the second group comprises one or more elements and each of the one or more elements in the second element group has a shape, and defining a second reference point (C ) for the second element group at a position relative to the shape of the one or more elements in the second element group. Still another repeated step is measuring a distance between the first reference point and the second reference point such that a distance measurement is identified for each of the plurality of different focus levels. Finally, the method selects as the best focus a focus level from the plurality of different focus levels and corresponding to a selected one of the distance measurements.

Integrated circuit system with automated best focus determination based on change in alignment due to predictable pattern degradation

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Plano, TX, United States of America

Zhicheng Tang