United Microelectronics Corp.

Zheng-Yang Li

Ji-Fu Kung

Chung-Jung Chen

Ching-Pei Lin

Yi-Cheng Lu

Li-Hsin Yang

Chun-Man Li

Chian-Chen Kuo

An automatic adjustment method and an automatic adjustment device of a beam of a semiconductor apparatus, and a training method of a parameter adjustment model are provided. The automatic adjustment method of the beam of the semiconductor apparatus includes the following steps. The semiconductor apparatus generates the beam. A wave curve of the beam is obtained. The wave curve is segmented into several sections. The slope of each of the sections is obtained. Several environmental factors of the semiconductor apparatus are obtained. According to the slopes and the environmental factors, at least one parameter adjustment command of the semiconductor apparatus is analyzed through the parameter adjustment model.

Automatic adjustment method and automatic adjustment device of beam of semiconductor apparatus, and training method of parameter adjustment model

A remote control device for a manufacturing equipment and a method for detecting manual control are provided. The method for detecting the manual control on the manufacturing equipment includes the following steps. A cursor pattern is created. When the user interface is automatically controlled, a history location of the cursor pattern shown on a user interface of the manufacturing equipment is detected to obtain a location distribution. The location distribution is stored. A current location of the cursor pattern shown on the user interface is detected. If the current location is not within the location distribution, it is deemed that the user interface is manually controlled.

Remote control device for manufacturing equipment and method for detecting manual control

Growing community of inventors

Kaohsiung, Taiwan

Zheng-Yang Li