Hewlett-packard Development Company, L.p.

Princeton University

Seagate Technology Incorporated

Seagate Technologies, Inc.

Zhaoning Yu

Stephen Y Chou

Wei E Wu

Han Cao

Robert H Austin

Shih-Yuan Wang

Kim Yang Lee

Jonas O Tegenfeldt

David S Kuo

Xiaomin Yang

Yautzong Hsu

Richard Stanley Williams

ShuaiGang Xiao

Zhiyong Li

Gennady G Gauzner

Wei Guang Wu

Duncan R Stewart

Jun Gao

Nobuo Kurataka

Warren J Robinett

Justin Jia-Jen Hwu

Wei Hu

Alexandre M Bratkovski

Henry Hung Yang

Gregory Stuart Snider

Li-Ping Wang

Carl E Picciotto

Michael R Feldbaum

Hong Ying Wang

HongYing Wang

Rene Johannes Marinus Van De Veerdonk

Shih-Yuan (sy) Wang

Ekaterina Viktorovna Ponizovskaya

Jonas O Tagenfeldt

Inkyu Park

Cao,han

Nanochannel arrays that enable high-throughput macromolecular analysis are disclosed. Also disclosed are methods of preparing nanochannel arrays and nanofluidic chips. Methods of analyzing macromolecules, such as entire strands of genomic DNA, are also disclosed, as well as systems for carrying out these methods.

Nanochannel arrays and their preparation and use for high throughput macromolecular analysis

Provided herein are apparatuses and methods, including patterning a first set of features in a servo zone to form a patterned servo zone while a first mask protects a data zone from the patterning. The first mask may be removed from the data zone. The apparatuses and methods may further include patterning a second set of features in the data zone to form a patterned data zone while a second mask protects the patterned servo zone from the patterning.

Templates for patterned media

Provided is an apparatus that includes a substrate; a first hard-mask pattern that includes a number of first features disposed over a top surface of the substrate; and a second hard-mask pattern disposed over the first hard-mask layer. The second hard-mask pattern includes a number of second features overlapping one or more of the first features.

Hard-mask defined bit pattern substrate

Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece. Also provided herein is a method, including providing a lithographic calibration standard having a functional layer to an analytical apparatus, wherein the functional layer has a composition characteristic of a workpiece of the analytical apparatus; providing calibration standard specifications to a computer interfaced with the analytical apparatus; and calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.

Calibration standard with pre-determined features

Provided herein is a method, including a) transferring an initial pattern of an initial template to a substrate; b) performing block copolymer self-assembly over the substrate with a density multiplication factor k; c) creating a subsequent pattern in a subsequent template with the density multiplication factor k; and d) repeating steps a)-c) with the subsequent template as the initial template until a design specification for the subsequent pattern with respect to pattern density and pattern resolution is met.

Block copolymer self-assembly for pattern density multiplication and rectification

A method of self-assembling density multiplied block copolymers (BCP) structures includes applying a block copolymer (BCP) to a feature-imprinted resist layer. The BCP is thermally annealed to laterally segregate the BCP into self-assembled columns of a first polymer block surrounded by a second polymer block.

Modified surface for block copolymer self-assembly

Provided herein are methods for depositing a spin-on-glass composition over an imprinted resist; curing the spin-on-glass composition to form a cured spin-on-glass composition; and forming a patterned mask by etching the cured spin-on-glass composition, the resist, and an underlying mask composition, wherein the patterned mask comprises features of the cured spin-on-glass composition atop the mask composition, and wherein curing the spin-on-glass composition is configured to prevent shifting or toppling of the spin-on glass composition from atop the mask composition while forming the patterned mask.

Patterned mask using cured spin-on-glass composition

Processes include aligning a disc with a template at a location so that the pattern from the template is transferred to the disc in a relative orientation. The relative orientation provides that when the disc with the transferred pattern is finally assembled into a hard disc drive, an inner diameter of the spindle hole of the disc may be abutted against an outer diameter of the disc drive spindle, and the data-containing patterns on the discs will be aligned concentrically with a center of the disc drive spindle. While the data-containing patterns are aligned concentrically with the disc drive spindle, the substrate itself is allowed to be non-concentric. Still other aspects include a disc having eccentric formations including PIM and one or more of bit patterns and servo information formed on a disc surface, the eccentricity of the formations is determined based on an expected difference between the radius of the spindle hole of the disc and the radius of the spindle on which the disc will be placed during assembly, with the PIM used to determine the angular alignment of the disc with the spindle.

Method of disc alignment using printed alignment marks

An imprint lithography apparatus including a service station.

Imprint lithography apparatus and methods

Growing community of inventors

Palo Alto, CA, United States of America

Zhaoning Yu