Agency for Science, Technology and Research

Zhaogang Dong

Ying Min Wang

Di Zhu

Xiao Ming Goh

Joel Kwang Wei Yang

Shawn Tan

Arseniy Kuznetsov

Kwang Wei Joel Yang

Yefeng Yu

Ramon Paniagua-Dominguez

A process for plasmonic-based high resolution color printing is provided. The process includes a) providing a nanostructured substrate surface having a reverse structure geometry comprised of nanopits and nanoposts on a support, and b) forming a conformal continuous metal coating over the nanostructured substrate surface to generate a continuous metal film, the continuous metal film defining nanostructures for the plasmonic-based high resolution color printing, wherein a periodicity of the nanostructures is equal to or less than a diffraction limit of visible light. A nanostructured metal film or metal-film coated support obtained by the process and a method for generating a color image are also provided.

Process for plasmonic-based high resolution color printing

This application relates to a method of forming nano-patterns on a substrate comprising the step of forming a plurality of nanostructures on a dielectric substrate, wherein the nanostructures are dimensioned or spaced apart from each other by a scaling factor of the dielectric substrate with reference to a silicon substrate.

Method of forming nano-patterns on a substrate

Growing community of inventors

Singapore, Singapore

Zhaogang Dong