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Applied Electron Corporation

Zeng-gi Yu

George J Collins

John R McNeil

A single-chamber apparatus and method are described for in-situ generation of dangerous polyatomic gases and radicals from solid or liquid source materials contained within a porous foamed structure. A cooled cathode is provided for establishing a plasma discharge within the chamber, and a heat source is provided to maintain the porous foamed structure within a fixed temperature range chosen such that the source material is removed from the porous foamed structure by evaporation induced by heat from the heat source while at the same time preventing consumption by evaporation of the porous foamed structure itself.

Single-chamber apparatus for in-situ generation of dangerous polyatomic

Apparatus for depositing and tailoring anisotropic properties of ceramic oxide-superconductor films onto the outer surface of fibers, wires, rods, and bars and onto the inner surface of tubes, as well as onto the surface of disc-shaped substrates, employs first and second vacuum chambers, a cylindrical magnetron structure positioned within the first vacuum chamber, a disc-shaped cold cathode positioned within the first vacuum chamber for providing a beam of energetic electrons for injection into a plasma region of the cylindrical magnetron structure, and a ring-shaped cold cathode positioned within the second vacuum chamber for providing a disc-shaped beam of electrons impinging upon the deposited film for annealing it. The magnetron cathodes comprise either single metal elements or mixtures thereof. A planar magnetron and a line-shaped cold cathode that produces an electron beam impinging on the surface of a planar substrate to provide a uniform strip heat zone are employed for depositing superconducting thin films of metal oxide ceramic materials onto the surface of wide area planar substrates.

Magnetron deposition of ceramic oxide-superconductor thin films

In-situ generation of dangerous polyatomic gases is achieved by providing a solid elemental or compound source, one or more gaseous feedstock sources, a plasma generated in a partial vacuum, and beam impingement on the target to rapidly evolve the elemental species of interest. The toxic, corrosive, and explosive gas so generated in-situ can be better handled safely with lower operating cost.

Apparatus and method for in-situ generation of dangerous polyatomic

A method for depositing and tailoring anisotropic properties of ceramic oxide superconductive films onto the outer surface of fibers, wires, rods, bars and onto the inner surface of tubes, as well as onto the surface of disc-shaped substrates, employs either tandem magnetron discharges alone or both an abnormal glow cold cathode electron gun together with tandem magnetron discharges. This deposition method provides uniform thin films having high growth rates, controllable stoichiometry and desired anisotropic microstructure. The magnetron cathodes are made from either mixtures or single elements of the metals. The oxygen component is achieved either from the cathode material itself or by reactive sputtering in an oxygen ambient or a post-deposition thermal or plasma oxidation. An external electron beam may also be used for in-situ annealing of the deposited films while placed under an external applied magnetic field to better align crystals in the films for the desired anisotropic superconducting properties. Thin metal or dielectric thin films are deposited as an interface layer and are placed both on the top of and under the metal oxide ceramic superconductive film material. Hermetic seal layers are deposited to protect the ceramic oxide superconductive films from being poisoned by foreign atoms.

Apparatus for generating multiply charged ions from a source of wide area for use in ion implantation is based upon electron beam plasma interactions which more efficiently create a large density of multiply ionized species than conventional plasma sources over a wide area (1-20 cm in diameter). The beam electrons are generated from a glow discharge electron gun operating in the abnormal glow discharge state. More multiply ionized species are created because of the larger number of electrons at high energy present in a beam created discharge as compared to conventional hollow cathode or thermionic cathode ion sources. By using a ring-shaped cold cathode beam electron generator it is possible to realize a wide area source 2-20 cm in diameter. This multiple ion source permits the realization of a fixed ion implantation energy using a lower electrostatic potential because multiply ionized species are accelerated rather than singly ionized species.

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Fort Collins, CO, United States of America

Zeng-gi Yu