Applied Materials Israel Limited

Zeev Zohar

Idan Kaizerman

Gadi Greenberg

Boaz Cohen

Assaf Asbag

Ohad Shaubi

Kirill Savchenko

Shiran Gan-Or

There are provided a classifier and a method of classifying defects in a semiconductor specimen. The classifier enables assigning each class to a classification group among three or more classification groups with different priorities. Classifier further enables setting purity, accuracy and/or extraction requirements separately for each class, and optimizing the classification results in accordance with per-class requirements. During training, the classifier is configured to generate a classification rule enabling the highest possible contribution of automated classification while meeting per-class quality requirements defined for each class.

Method of classifying defects in a semiconductor specimen and system thereof

Inspection apparatus includes an imaging module, which is configured to capture images of defects at different, respective locations on a sample. A processor is coupled to process the images so as to automatically assign respective classifications to the defects, and to autonomously control the imaging module to continue capturing the images responsively to the assigned classifications.

Closed-loop automatic defect inspection and classification

A method for generating a synthetic image of a region of an object, includes: generating, by a charged particle microscope, a charged particle microscope image of the region of the object; calculating a sparse representation of the charged particle microscope image; wherein the sparse representation of the charged particle microscope image comprises multiple first atoms; generating the synthetic image of the region, wherein the synthetic image of the region is formed from multiple second atoms; wherein the generating of the synthetic image of the region is based on a mapping between the multiple first atoms and the multiple second atoms; wherein the charged particle microscope image and the multiple first atoms are of a first resolution; and wherein the synthetic image of the region and the multiple second atoms are of a second resolution that is finer than the first resolution.

Method and system for generating a synthetic image of a region of an object

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Migdal, Israel

Zeev Zohar