Texas Instruments Corporation

Zaichen Chen

Akram Ali Salman

Binghua Hu

Aravind Chennimalai Appaswamy

James Paul DiSarro

An integrated circuit includes a semiconductor substrate having a doped region, e.g. a DWELL, with a first conductivity type. A source region is located within the doped region, the source region having a second opposite conductivity type. A drain region having the second conductivity type is spaced apart from the source region. A gate electrode is located between the source region and the drain region, the gate electrode partially overlapping the doped region. A body region having the first conductivity type is located within the doped region. A dielectric layer forms a closed path around the body region.

Silicide-block-ring body layout for non-integrated body LDMOS and LDMOS-based lateral IGBT

An electrostatic discharge protection system with a node adapted to receive a signal and threshold detecting circuitry coupled to the node. The system includes an IGBT having an IGBT gate coupled to an output of the threshold detecting circuitry, a resistor coupled between an IGBT emitter of the IGBT and a low reference potential node, and a BJT having a BJT base coupled to the IGBT emitter.

Compact area electrostatic discharge protection circuit

An electronic device includes a substrate having a second conductivity type including a semiconductor surface layer with a buried layer (BL) having a first conductivity type. In the semiconductor surface layer is a first doped region (e.g., collector) and a second doped region (e.g., emitter) both having the first conductivity type, with a third doped region (e.g., a base) having the second conductivity type within the second doped region, wherein the first doped region extends below and lateral to the third doped region. At least one row of deep trench (DT) isolation islands are within the first doped region each including a dielectric liner extending along a trench sidewall from the semiconductor surface layer to the BL with an associated deep doped region extending from the semiconductor surface layer to the BL. The deep doped regions can merge forming a merged deep doped region that spans the DT islands.

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Zaichen Chen