Central Glass Company, Limited

Yuzuru Kaneko

Asuka Sano

Keiko Sasaki

Yusuke Nomura

Takashi Aoki

Satoru Miyazawa

Ryo Nadano

Tsubasa Itakura

An object of the present invention is to provide a photosensitive resin composition having good liquid repellency. The photosensitive resin composition of the present invention at least contains a fluororesin having a crosslinking site, a solvent, and a photopolymerization initiator, and the fluororesin contains a repeating unit derived from a hydrocarbon having a fluorine atom.

Photosensitive resin composition, method for producing cured product of fluororesin, fluororesin, fluororesin film, bank and display element

The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film including a substrate and a patterned film on the substrate, to obtain a first substrate with a patterned film; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film, wherein the patterned film of the first substrate with a patterned film has a contact angle decreased in the cleaning step, and the patterned film of the second substrate with a patterned film has a contact angle recovered in the heating step.

Method for producing substrate with patterned film

The production method of a substrate with a patterned film according to the present disclosure includes: a cleaning step of performing UV/ozone cleaning or oxygen plasma cleaning on a substrate with a patterned film to obtain a first substrate with a patterned film, the substrate with a patterned film including a substrate and a patterned film on the substrate, the patterned film containing a fluorine-containing copolymer having a specific repeating unit; and a heating step of heating the first substrate with a patterned film to obtain a second substrate with a patterned film.

Method for producing substrate with patterned film and fluorine-containing copolymer

Provided is a fluorine-containing polymer which has no perfluoroalkyl group of 4 or more carbon atoms and which, when formed together with a photoacid generator into a film, shows water repellency after film formation, but becomes hydrophilic by the action of an acid generated under light irradiation, and thus serves as a pattern forming material capable of forming a film with high sensitivity and resolution. A fluorine-containing polymer according to the present invention has a repeating unit of the formula (1) where Ris a hydrogen atom, a fluorine atom or a C-Calkyl group; Rto Rare each independently a hydrogen atom or a C-Calkyl group; X is a single bond or a divalent group; Y is a C-Cfluoroalkyl or carboxylate (&#x2014;COOR) group; R is a C-Cfluoroalkyl group; and seven or less of hydrogen atoms contained in the substituent group may be substituted with fluorine.

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Saitama, Japan

Yuzuru Kaneko