Fujifilm Corporation

Yuzo Nagata

Yushi Kaneko

Yoshihiro Nakai

Shigeki Uehira

Makoto Kubota

Hiroaki Idei

Atsuyasu Nozaki

Yousuke Murakami

Kenta Ushijima

Shinichi Kanna

Kimiatsu Nomura

Atsushi Osawa

Masaru Yoshikawa

Yoichi Maruyama

Toshihide Yoshitani

Hiroki Sugiura

Yoshiharu Yabuki

Toshiaki Aoai

Hiroo Takizawa

Tomotaka Tsuchimura

Kazuto Shimada

Tetsu Kitamura

Akio Tamura

Kazuya Oota

Satoru Yamada

Kazuhiro Fujimaki

Naoyuki Hayashi

Hideki Takakuwa

Yoshinori Kanazawa

Kaoru Aoyagi

Nobuyuki Akutagawa

Takuya Tsuruta

Hiroyuki Einaga

Toshiyuki Saie

Reiko Inushima

Junichi Itou

A polyorganosilsesquioxane includes: a constitutional unit (a) having a fluorine atom-containing group; a constitutional unit (b) having a cationically polymerizable group; and a constitutional unit (c) having a radically polymerizable group.

Polyorganosilsesquioxane and composition for forming hardcoat layer

Provided are a resin material that provides a resin shaped article (such as a resin sheet) having an acoustic impedance close to that of a living body, a reduced acoustic wave attenuation even at high frequencies (such as 10 MHz), and high hardness and high tear strength, and that is suitable as a lens material for acoustic wave probes; an acoustic lens, an acoustic wave probe, an acoustic wave determination device, an ultrasound diagnostic apparatus, a photo-acoustic wave determination device, and an ultrasonic endoscope that employ the above-described resin material as a constituent material; and a method for producing the above-described acoustic lens.

Acoustic-wave-probe resin material, acoustic lens, acoustic wave probe, acoustic wave determination device, ultrasound diagnostic apparatus, photo-acoustic wave determination device, ultrasonic endoscope, and method for producing acoustic lens

Provided are a resin material for an acoustic lens including a resin (a) containing at least one of an epoxy group, a carbon-carbon double bond group, a methylol group, or a phenolic hydroxyl group; and a resin (b) containing a structural unit having a polysiloxane bond, and an acoustic lens, an acoustic wave probe, an acoustic wave measurement apparatus, an ultrasound diagnostic apparatus, a photoacoustic wave measurement apparatus, and an ultrasound endoscope in which the resin material is used.

Resin material for acoustic lens, acoustic lens, acoustic wave probe, acoustic wave measurement apparatus, ultrasound diagnostic apparatus, photoacoustic wave measurement apparatus, and ultrasound endoscope

Provided are a resin material for an acoustic wave probe which contains a polymer formed of at least one of a structural unit (a) having a specific polysiloxane bond or a structural unit (b) having a specific partial structure, in which the structural unit (b) having the specific partial structure is an acryloyloxy structural unit (b1), an acrylamide structural unit (b2), or a styrene structural unit (b3); an acoustic lens; an acoustic wave probe; an acoustic wave measurement apparatus; an ultrasound diagnostic apparatus; a photoacoustic wave measurement apparatus; and an ultrasound endoscope.

Resin material for acoustic wave probe, acoustic lens, acoustic wave probe, acoustic wave measurement apparatus, ultrasonic diagnostic apparatus, photoacoustic wave measurement apparatus, and ultrasound endoscope

Provided are a resin composition for an acoustic wave probe including, a polymer which has a structural unit having a siloxane bond and a structural unit having a urea bond, an acoustic lens using the same, the acoustic wave probe, acoustic wave measurement apparatus, ultrasound diagnostic apparatus, photoacoustic wave measurement apparatus, and ultrasound endoscope.

Resin composition for acoustic wave probe, and acoustic lens using the same, acoustic wave probe, acoustic wave measurement apparatus, ultrasound diagnostic apparatus, photoacoustic wave measurement apparatus, and ultrasound endoscope

An object of the present invention is to provide an n-type thermoelectric conversion layer, which has a high power factor and exhibits excellent performance stability, a thermoelectric conversion element including the n-type thermoelectric conversion layer, and a composition for forming an n-type thermoelectric conversion layer used in the n-type thermoelectric conversion layer. The n-type thermoelectric conversion layer of the present invention contains carbon nanotubes and an amine compound which is represented by General Formula (1) or (2) and has a C log P value of 2.0 to 8.2. 

N-type thermoelectric conversion layer, thermoelectric conversion element, and composition for forming N-type thermoelectric conversion layer

A thermoelectric conversion layer contains carbon nanotubes and a surfactant, and in an upper portion and a lower portion and/or a side face end surface and a center, a mass ratio obtained by dividing the carbon nanotubes by the surfactant is higher in the upper portion and/or the end surface than in the other portions. A layer which contains carbon nanotubes and a surfactant and will become a thermoelectric conversion element is formed, the layer is washed with a washing agent which dissolves the surfactant but does not dissolve the carbon nanotubes. Accordingly, provided is a thermoelectric conversion element and a thermoelectric conversion module, each having not only high adhesiveness between the substrate and the thermoelectric conversion layer but also excellent thermoelectric conversion performance; and methods for manufacturing the thermoelectric conversion element and the thermoelectric conversion module.

Thermoelectric conversion element, thermoelectric conversion module, method for manufacturing thermoelectric conversion element, and method for manufacturing thermoelectric conversion module

Provided is a semiconductor device which includes a semiconductor layer and an insulating layer adjacent to the semiconductor layer, in which the insulating layer is formed of a crosslinked product of a polymer compound that has a repeating unit (IA) represented by the following Formula (IA) and a repeating unit (IB) represented by the following Formula (IB); and an insulating layer-forming composition which is used for forming an insulating layer of a semiconductor device and contains a polymer compound that has the following repeating units (IA) and (IB).  In Formulae, Rand Reach independently represent a hydrogen atom, a halogen atom, or an alkyl group. L, L, and Leach independently represent a single bond or a linking group. X represents a crosslinkable group and Yrepresents a decomposable group or a hydrogen atom. m1a and m2a each independently represent an integer of 1 to 5. The symbol '*' represents a bonding position of the repeating units.

Semiconductor device and insulating layer-forming composition

A coloring composition is provided which is less likely to remain on a pattern of other colors as residues and can inhibit occurrence of coating defects. Also provided are a colored pattern, a color filter, a method of producing a color filter, a pattern forming method, a solid-state imaging device, and an image display device, each using the coloring composition. The coloring composition contains a resin (A) having a dye structure, in which in the peak area of the total molecular weight distribution of the resin (A) as measured by gel permeation chromotography, the proportion of the peak area of a component having a molecular weight of 20,000 or more is 10% or less.

Coloring composition, colored pattern, color filter and method of producing the same, pattern forming method, solid-state imaging device, and image display device

Disclosed is a coloring composition with satisfactory heat resistance, no discoloration, excellent developability, and no development residues on a substrate and pixels of other colors, providing, a coloring composition for a color filter including (A) a polymer having a dye skeleton and (B) an organic solvent, wherein the content of an unreacted monomer component having the dye skeleton which is capable of forming (A) the polymer having the dye skeleton is less than or equal to 1 mass % with regard to (A) the polymer having the dye skeleton.

Coloring composition, coloring radiation-sensitive composition, color filter and solid-state imaging device

There is provided a photosensitive transparent composition for a color filter of a solid-state imaging device, containing (A) a photopolymerization initiator, (B) a polymerizable compound, and (C) an alkali-soluble resin, wherein the cured film obtained from the photosensitive transparent composition has a refractive index of 1.60 to 1.90 for light at a wavelength of 633 nm.

Photosensitive transparent composition for color filter of solid-state imaging device, and production method of color filter of solid-state imaging device, color filter of solid-state imaging device, and solid-state imaging device, each using the same

The invention provides a dispersed composition including: (A) titanium black; (B) a polymer compound including a constituent component having a side chain structure to which an acidic group is linked via a linking group; and (C) a solvent. The (B) polymer compound is a polymer having a structure in which an acidic group is linked to a main chain part via a linking group.

Dispersed composition, polymerizable composition, light shielding color filter, liquid crystal display device having light shielding color filter, solid-state imaging device, wafer-level lens, and imaging unit having wafer-level lens

The radiation-sensitive colored composition contains (A) a dye polymer containing a structural unit having a dye structure polymerized using a chain-transfer agent having a LogP value of 5 or less, and (B) a solvent.

Radiation-sensitive colored composition, color filter, method for producing a color pattern, method for producing color filter, solid-state imaging device, and liquid crystal display apparatus

The object of the present invention is to provide a radiation-sensitive colored composition which can suppress the generation of the contamination of the device. A radiation-sensitive colored composition includes: (A) a dye containing of from 10 ppm to 1000 ppm of a halogen ion; (B) a polymerizable compound; and (C) a solvent.

Radiation-sensitive colored composition, colored cured film, color filter and method of producing the same, solid-state imaging device, liquid crystal display apparatus, and method of producing dye

A photosensitive resin composition which can form a pattern attaining high resolution and having a high refractive index and a high transmittance is provided. The photosensitive resin composition includes a dispersion composition including (A) titanium dioxide particles having an average primary particle diameter of from 1 nm to 100 nm, (B) a graft copolymer that has a graft chain having a number of atoms other than hydrogen atoms in a range of from 40 to 10,000 and (C) a solvent, and (D) a polymerizable compound, and (E) a polymerization initiator.

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Shizuoka, Japan

Yuzo Nagata