Nihon Shinku Gijutsu Kabushiki Kaisha

Yuzo Murata

Kyuzo Nakamura

Yoshifumi Ota

Noriaki Tani

Satoru Ishibashi

Michio Ishikawa

Takashi Komatsu

Masanori Hashimoto

Yasushi Higuchi

A method of producing by sputtering an In-O, Sn-O, Zn-O, Cd-Sn-O or Cd-In-O based transparent conductive film according to the present invention uses the addition of a donor element, if needed. The sputtering is carried out by maintaining an intensity of a magnetic field on a surface of a target at 600 Oe or greater as well as by charging the target with a DC electric field superimposed by an RF electric field. An apparatus for producing an In-O, Sn-O, Zn-O, Cd-Sn-O or Cd-In-O base transparent conductive film uses the addition of a donor element, if needed. The apparatus has a vacuum chamber adapted to support therein a substrate and a target in an opposed relationship for forming by sputtering the transparent conductive film on the substrate by plasma discharge generated therebetween. The apparatus has a device for forming a magnetic field having a predetermined intensity of 600 Oe or greater on a surface of the target, a DC power supply for charging the target with a DC electric field, and an RF power supply for charging the target with an RF electric field superimposed on the DC electric field.

Method for producing transparent conductive films

A magnetic recording member having high coercive force, comprising:

Magnetic recording member

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Yachimata, Japan

Yuzo Murata