Jsw Aktina System Co., Ltd.

Yuzaburo Ota

Suk-Hwan Chung

Ryosuke Sato

Kenichi Ohmori

A laser processing device and a laser processing method that are capable of forming a high-quality semiconductor film are provided. An ELA device (excimer laser annealing device) () includes a laser oscillator () that generates laser light for forming a polysilicon film by irradiating an amorphous silicon film over a substrate to be processed with the laser light, a pulse measuring instrument () for detecting first partial light and second partial light contained in the laser light, and a monitoring device () for comparing a detection result of the first partial light with a detection result of the second partial light.

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Tokyo, Japan

Yuzaburo Ota