Tokyo Electron Limited

Yuya Motoyama

Shuuichi Nishikido

Shogo Fukui

Noritaka Uchida

Takanori Obaru

Tomohito Ura

Hidetaka Shinohara

Contamination of a bottom surface of a substrate caused by a processing liquid used for cleaning a top surface of the substrate can be suppressed. After performing a liquid processing on the top surface of the substrate and a liquid processing on the bottom surface of the substrate in parallel while rotating the substrate by a substrate holding/rotating unit, when stopping the liquid processing on the top surface of the substrate and the liquid processing on the bottom surface of the substrate, a control unitstops a supply of the processing liquid onto the top surface of the substrate by a first processing liquid supply device, and then, stops a supply of the processing liquid onto the bottom surface of the substrate by a second processing liquid supply device

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Koshi, Japan

Yuya Motoyama